Mechanism for low-etching resistance and surface roughness of ArF photoresist during plasma irradiation

Published 2009 View Full Article

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Title
Mechanism for low-etching resistance and surface roughness of ArF photoresist during plasma irradiation
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 105, Issue 5, Pages 053309
Publisher
AIP Publishing
Online
2009-03-13
DOI
10.1063/1.3089245
References
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