Fluid simulation of the E-H mode transition in inductively coupled plasma

Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching

(2008) M. Avella et al.   APPLIED PHYSICS LETTERS

Plasma power measurement and hysteresis in the E–H transition of a rf inductively coupled plasma system

(2008) A. M. Daltrini et al.   APPLIED PHYSICS LETTERS

Hysteresis and mode transition in terms of electron energy distribution function for an inductively coupled argon discharge

(2008) S. V. Singh   JOURNAL OF APPLIED PHYSICS

Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition

(2008) Junshuai Li et al.   JOURNAL OF APPLIED PHYSICS

Electrical characterization of an inductively coupled gaseous electronics conference reference cell

(2008) S. V. Singh et al.   JOURNAL OF APPLIED PHYSICS

Inductively Coupled Plasma Etching of Indium Zinc Oxide Thin Films with HBr∕Ar Discharges

(2008) Do Young Lee et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of capacitive to inductive coupling transition in multiple linear U-type antenna on silicon thin film deposition from pure SiH4 discharges

(2008) Hong Bum Kim et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A