Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition

Published 2008 View Full Article

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Title
Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 103, Issue 4, Pages 043505
Publisher
AIP Publishing
Online
2008-02-22
DOI
10.1063/1.2885158

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