Diffusion mechanism and the thermal stability of fluorine ions in GaN after ion implantation

Title
Diffusion mechanism and the thermal stability of fluorine ions in GaN after ion implantation
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 105, Issue 8, Pages 083519
Publisher
AIP Publishing
Online
2009-04-23
DOI
10.1063/1.3106561

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