Characterization of high-k HfO2 films prepared using chemically modified alkoxy-derived solutions

Published 2009 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Characterization of high-k HfO2 films prepared using chemically modified alkoxy-derived solutions
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 105, Issue 6, Pages 061631
Publisher
AIP Publishing
Online
2009-03-17
DOI
10.1063/1.3055340

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.