Extrinsic interface formation of HfO2 and Al2O3∕GeOx gate stacks on Ge (100) substrates

Title
Extrinsic interface formation of HfO2 and Al2O3∕GeOx gate stacks on Ge (100) substrates
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 106, Issue 4, Pages 044909
Publisher
AIP Publishing
Online
2009-08-27
DOI
10.1063/1.3204026

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