Optical properties of high aspect ratio plasma etched silicon nanowires: fabrication-induced variability dramatically reduces reflectance

Published 2015 View Full Article

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Title
Optical properties of high aspect ratio plasma etched silicon nanowires: fabrication-induced variability dramatically reduces reflectance
Authors
Keywords
-
Journal
NANOTECHNOLOGY
Volume 26, Issue 8, Pages 085301
Publisher
IOP Publishing
Online
2015-02-04
DOI
10.1088/0957-4484/26/8/085301

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