Optical properties of high aspect ratio plasma etched silicon nanowires: fabrication-induced variability dramatically reduces reflectance

出版年份 2015 全文链接

标题

作者

关键词

出版物

Volume 26, Issue 8, Pages 085301

出版商

IOP Publishing

发表日期

2015-02-04

DOI

10.1088/0957-4484/26/8/085301

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