Fabrication of ferroelectric Fe doped HfO2 epitaxial thin films by ion-beam sputtering method and their characterization

Published 2018 View Full Article

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Title
Fabrication of ferroelectric Fe doped HfO2 epitaxial thin films by ion-beam sputtering method and their characterization
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 57, Issue 11S, Pages 11UF02
Publisher
Japan Society of Applied Physics
Online
2018-08-31
DOI
10.7567/jjap.57.11uf02

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