Fabrication of ferroelectric Fe doped HfO2 epitaxial thin films by ion-beam sputtering method and their characterization

出版年份 2018 全文链接

标题

作者

关键词

出版物

Volume 57, Issue 11S, Pages 11UF02

出版商

Japan Society of Applied Physics

发表日期

2018-08-31

DOI

10.7567/jjap.57.11uf02

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