Effect of amino ligand size of Si precursors on initial reaction with an –OH-terminated Si(001) surface for atomic layer deposition

Initial Surface Reaction of Di-Isopropylaminosilane on a Fully Hydroxyl-Terminated Si (001) Surface

(2014) Jin-Hoon Yang et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Initial reaction of silicon precursors with a varying number of dimethylamino ligands on a hydroxyl-terminated silicon (001) surface

(2013) Yong-Chan Jeong et al.   APPLIED SURFACE SCIENCE

Initial Reaction of Dimethylaluminum Isopropoxide with Hydrogen-Terminated Si (001) Surface Using Density Functional Theory

(2013) Dae-Hee Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Adsorption and surface reaction of bis-diethylaminosilane as a Si precursor on an OH-terminated Si (001) surface

(2012) Seung-Bin Baek et al.   APPLIED SURFACE SCIENCE

Enhancement of FinFET performance using 25-nm-thin sidewall spacer grown by atomic layer deposition

(2012) Kazuhiko Endo et al.   SOLID-STATE ELECTRONICS

Energy barriers for trimethylaluminum reaction with varying surface hydroxyl density

(2011) Dae-Hee Kim et al.   APPLIED SURFACE SCIENCE

Improved Description of the Structure of Molecular and Layered Crystals: Ab Initio DFT Calculations with van der Waals Corrections

(2010) Tomáš Bučko et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

Assessing the performance of recent density functionals for bulk solids

(2009) Gábor I. Csonka et al.   PHYSICAL REVIEW B

VESTA: a three-dimensional visualization system for electronic and structural analysis

(2008) Koichi Momma et al.   JOURNAL OF APPLIED CRYSTALLOGRAPHY

Optimization methods for finding minimum energy paths

(2008) Daniel Sheppard et al.   JOURNAL OF CHEMICAL PHYSICS