Self-Assembling Formation of Ni Nanodots on SiO2Induced by Remote H2Plasma Treatment and Their Electrical Charging Characteristics

Published 2008 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Self-Assembling Formation of Ni Nanodots on SiO2Induced by Remote H2Plasma Treatment and Their Electrical Charging Characteristics
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 47, Issue 4, Pages 3099-3102
Publisher
Japan Society of Applied Physics
Online
2008-04-25
DOI
10.1143/jjap.47.3099

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.