Self-Assembling Formation of Ni Nanodots on SiO2Induced by Remote H2Plasma Treatment and Their Electrical Charging Characteristics

出版年份 2008 全文链接

标题

作者

关键词

出版物

Volume 47, Issue 4, Pages 3099-3102

出版商

Japan Society of Applied Physics

发表日期

2008-04-25

DOI

10.1143/jjap.47.3099

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