High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution

Title
High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution
Authors
Keywords
Optical lithography, Resolution enhancement technologies, Electron beam lithography, Throughput, Multi-beams
Journal
MICROELECTRONIC ENGINEERING
Volume 133, Issue -, Pages 23-35
Publisher
Elsevier BV
Online
2014-11-29
DOI
10.1016/j.mee.2014.11.015

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