Design optimization of diamond disk pad conditioners

Multiobjective firefly algorithm for continuous optimization

(2012) Xin-She Yang   ENGINEERING WITH COMPUTERS

Development of a pad conditioning simulation module with a diamond dresser for CMP applications

(2010) Hsiu-Ming Yeh et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Investigation on Surface Hardening of Polyurethane Pads During Chemical Mechanical Polishing (CMP)

(2010) Ji Chul Yang et al.   JOURNAL OF ELECTRONIC MATERIALS

Polycrystalline diamond shaving conditioner for CMP pad conditioning

(2010) Ming-Yi Tsai   JOURNAL OF MATERIALS PROCESSING TECHNOLOGY

Novel diamond conditioner dressing characteristics of CMP polishing pad

(2009) Ming-Yi Tsai et al.   INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

Theoretical and Experimental Investigation of Conditioner Design Factors on Tribology and Removal Rate in Copper Chemical Mechanical Planarization

(2009) Leonard Borucki et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Investigating the effect of diamond size and conditioning force on chemical mechanical planarization pad topography

(2009) T. Sun et al.   MICROELECTRONIC ENGINEERING