28 nm 50% Power-Reducing Contacted Mask Read Only Memory Macro With 0.72-ns Read Access Time Using 2T Pair Bitcell and Dynamic Column Source Bias Control Technique

Title
28 nm 50% Power-Reducing Contacted Mask Read Only Memory Macro With 0.72-ns Read Access Time Using 2T Pair Bitcell and Dynamic Column Source Bias Control Technique
Authors
Keywords
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Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2013-04-02
DOI
10.1109/tvlsi.2013.2246201

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