Atomic Layer Deposition of $\hbox{SiO}_{2}$ for AlGaN/GaN MOS-HFETs

Published 2012 View Full Article

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Title
Atomic Layer Deposition of $\hbox{SiO}_{2}$ for AlGaN/GaN MOS-HFETs
Authors
Keywords
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Journal
IEEE ELECTRON DEVICE LETTERS
Volume 33, Issue 9, Pages 1240-1242
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2012-07-20
DOI
10.1109/led.2012.2203782
References
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