Linear Scaling of Reset Current Down to 22-nm Node for a Novel $\hbox{Cu}_{x}\hbox{Si}_{y}\hbox{O}$ RRAM

Authors

Keywords

Journal

Volume 33, Issue 1, Pages 89-91

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Online

2011-10-31

DOI

10.1109/led.2011.2170654

References

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