4.6 Article

Complementary Germanium Electron-Hole Bilayer Tunnel FET for Sub-0.5-V Operation

Journal

IEEE ELECTRON DEVICE LETTERS
Volume 33, Issue 2, Pages 167-169

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2011.2175898

Keywords

Band-to-band tunneling (BTBT); electron-hole (EH) bilayer; field-effect transistor (FET); germanium; subthreshold slope; tunnel FET (TFET)

Funding

  1. European Community [257267]

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In this letter, we present a novel device, the germanium electron-hole (EH) bilayer tunnel field-effect transistor, which exploits carrier tunneling through a bias-induced EH bilayer. The proposed architecture provides a quasi-ideal alignment between the tunneling path and the electric field controlled by the gate. The device principle and performances are studied by 2-D numerical simulations. This device allows interesting features in terms of low operating voltage (< 0.5 V), due to its super-steep subthreshold slope (SSAVG similar to 13 mV/dec over six decades of current), I-ON/I-OFF ratio of similar to 10(9), and drive current of I-ON similar to 10 mu A/mu m at V-DD = 0.5 V. The same structure with symmetric voltages can be used to achieve a p-type device with I-ON and I-OFF levels comparable to the n-type, which enables a straightforward implementation of complementary logic that could theoretically reach a maximum operating frequency of 1.39 GHz when V-DD = 0.25 V.

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