Higher Gate Capacitance Ge n-MOSFETs Using Laser Annealing

Improved Capacitance Density and Reliability of High-$ \kappa$$\hbox{Ni}/\hbox{ZrO}_{2}/\hbox{TiN}$ MIM Capacitors Using Laser-Annealing Technique

(2010) C Y Tsai et al.   IEEE ELECTRON DEVICE LETTERS

Oxygen vacancies in high dielectric constant oxides La2O3, Lu2O3, and LaLuO3

(2009) Ka Xiong et al.   APPLIED PHYSICS LETTERS

A low-cost method of forming epitaxy SiGe on Si substrate by laser annealing

(2009) C. Y. Ong et al.   APPLIED PHYSICS LETTERS

High Performance of Ge nMOSFETs Using $\hbox{SiO}_{2}$ Interfacial Layer and TiLaO Gate Dielectric

(2009) W.B. Chen et al.   IEEE ELECTRON DEVICE LETTERS

Laser Annealing of Amorphous Germanium on Silicon–Germanium Source/Drain for Strain and Performance Enhancement in pMOSFETs

(2008) Fangyue Liu et al.   IEEE ELECTRON DEVICE LETTERS

Low Subthreshold Swing HfLaO/Pentacene Organic Thin-Film Transistors

(2008) M.F. Chang et al.   IEEE ELECTRON DEVICE LETTERS