Oxygen-Soluble Gate Electrodes for Prolonged High-$ \kappa$ Gate-Stack Reliability

Electrode material dependent breakdown and recovery in advanced high-κ gate stacks

(2010) X. Wu et al.   APPLIED PHYSICS LETTERS

Direct visualization and in-depth physical study of metal filament formation in percolated high-κ dielectrics

(2010) X. Li et al.   APPLIED PHYSICS LETTERS

Unipolar recovery of dielectric breakdown in fully silicided high-κ gate stack devices and its reliability implications

(2010) N. Raghavan et al.   APPLIED PHYSICS LETTERS

Tri-Level Resistive Switching in Metal-Nanocrystal-Based $\hbox{Al}_{2}\hbox{O}_{3}/\hbox{SiO}_{2}$ Gate Stack

(2010) Y. N. Chen et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

High-κ/Metal Gate Science and Technology

(2009) Supratik Guha et al.   Annual Review of Materials Research

The interaction of oxygen vacancies with grain boundaries in monoclinic HfO2

(2009) Keith McKenna et al.   APPLIED PHYSICS LETTERS