Time-temperature dependence of positive gate bias stress and recovery in amorphous indium-gallium-zinc-oxide thin-film-transistors

标题
Time-temperature dependence of positive gate bias stress and recovery in amorphous indium-gallium-zinc-oxide thin-film-transistors
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 98, Issue 15, Pages 153511
出版商
AIP Publishing
发表日期
2011-04-18
DOI
10.1063/1.3580611

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