Comparative study of electrical instabilities in top-gate InGaZnO thin film transistors with Al2O3 and Al2O3/SiNx gate dielectrics

标题
Comparative study of electrical instabilities in top-gate InGaZnO thin film transistors with Al2O3 and Al2O3/SiNx gate dielectrics
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 94, Issue 22, Pages 222112
出版商
AIP Publishing
发表日期
2009-06-08
DOI
10.1063/1.3151865

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