标题
Al2
O3
/HfO2
Multilayer High-k Dielectric Stacks for Charge Trapping Flash Memories
作者
关键词
-
出版物
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume -, Issue -, Pages 1700854
出版商
Wiley
发表日期
2018-03-26
DOI
10.1002/pssa.201700854
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- On the Control of the Fixed Charge Densities in Al2O3-Based Silicon Surface Passivation Schemes
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