Article
Nanoscience & Nanotechnology
Jiajing Li, Paulina A. Rincon-Delgadillo, Hyo Seon Suh, Geert Mannaert, Paul F. Nealey
Summary: Directed self-assembly of block copolymers has attracted interest from the semiconductor industry due to its potential for achieving semiconductor-relevant structures with a relatively simple and low-cost process. However, the kinetic trapping of self-assembling structures into defective states poses challenges for high-volume manufacturing. A study on the kinetics of defect annihilation in chemoepitaxy DSA revealed a statistical model that suggests all dislocations can be removed by sufficiently long annealing time. Further analysis showed that the distribution of defects is largely influenced by the role of guiding stripes.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Nanoscience & Nanotechnology
Anette Lofstrand, Reza Jafari Jam, Johannes Svensson, Adam Jonsson, Heera Menon, Daniel Jacobsson, Lars-Erik Wernersson, Ivan Maximov
Summary: Fabricating next generation transistors requires new technological requirements, such as smaller size and higher density structures. This study demonstrates the use of directed self-assembly of block copolymer to fabricate vertical III-V nanowires with small pitch, which is important for realizing dense gate all-around transistors. It is also shown that the orientation of the block copolymer affects the facet configuration of the nanowires and their spacing.
ADVANCED ELECTRONIC MATERIALS
(2022)
Article
Chemistry, Multidisciplinary
Runze Liu, Hejin Huang, Zehao Sun, Alfredo Alexander-Katz, Caroline A. Ross
Summary: This study presents a method of directed self-assembly using multiple mechanisms to generate well-aligned nanomesh structures, which is then extended to fabricate multi-component metallic structures with 2D/3D hybrid morphologies.
Article
Polymer Science
Yanyan Zhu, Changhang Huang, Liangshun Zhang, David Andelman, Xingkun Man
Summary: The kinetic paths of structural evolution and formation of block copolymer (BCP) particles were investigated using dynamic self-consistent field theory (DSCFT). The study revealed that the self-assembly process of BCP in a poor solvent leads to the formation of striped ellipsoids, onion-like particles, and double-spiral lamellar particles. The shape transition between onion-like particles and striped ellipsoidal ones can be reversible by controlling the temperature and solvent selectivity. Additionally, changing the intermediate bi-continuous structure into a layered one is crucial for the formation of striped ellipsoidal particles.
MACROMOLECULAR RAPID COMMUNICATIONS
(2023)
Article
Polymer Science
Hyeong Min Jin, Su Eon Lee, Simon Kim, Ju Young Kim, Young-Soo Han, Bong Hoon Kim
Summary: This study focuses on using near-infrared laser photothermal treatment to enhance the self-assembly of high-chi block copolymers (BCPs) and achieve highly aligned nanoscale patterned structures on silicon substrates. By controlling the molecular weight and loading metal ions, the formation of highly ordered nanodomains and aligned metal nanowires is successfully achieved. The compatibility of the laser writing process with conventional semiconductor processes is also demonstrated.
JOURNAL OF APPLIED POLYMER SCIENCE
(2022)
Review
Chemistry, Multidisciplinary
Luoxing Xiang, Qian Li, Chen Li, Qiqi Yang, Fugui Xu, Yiyong Mai
Summary: Porous materials with ordered bicontinuous structures have attracted attention due to their ordered periodic structures, efficient mass diffusion, and exceptional optical and magnetic properties. Block copolymer self-assembly is a versatile strategy for preparing these materials.
ADVANCED MATERIALS
(2023)
Article
Chemistry, Multidisciplinary
Dong Hyup Kim, So Youn Kim
Summary: This study introduces a directed self-assembly strategy to control the pattern direction of strand morphology by gradual morphology transition, and successfully fabricates highly aligned nanostrand arrays in a large area. In addition, a method for density-doubled metal nanowire fabrication and hierarchical BCP nanopatterning using the aligned nanostrand array as a template is demonstrated.
ADVANCED MATERIALS INTERFACES
(2022)
Article
Polymer Science
Guoxing Liao, Lei Chen, Yunjie Zhang, Oleksandr O. Mykhaylyk, Paul D. Topham, Daniel T. W. Toolan, Matthew J. Derry, Jonathan R. Howse, Qianqian Yu, Guiju Feng, Linge Wang
Summary: Block copolymer-based nanoproducts have great potential in high-end applications, but there is a lack of detailed studies on the nanofabrication process and the monitoring of concomitant self-assembled structural transitions. This study utilizes time-resolved small-angle X-ray scattering to track the nanostructural changes. The results provide guidelines for accessing various nanostructures from self-assembling block copolymers.
Article
Nanoscience & Nanotechnology
Jin Yong Shin, Bom Lee, Heo Yeon Lim, Simon Kim, Seong-Jun Jeong
Summary: The proposed TDSA method allows for neutral surface-free vertical orientations of BCP nanopatterns, independent of substrate polarizability, and can generate various morphologies by adjusting trench width and BCP molecular weight. This method has the potential advantage for designing process/device layouts needed for effective manufacturing processes.
Article
Polymer Science
R. Simonutti, D. Bertani, R. Marotta, S. Ferrario, D. Manzone, M. Mauri, M. Gregori, A. Orlando, M. Masserini
Summary: This study investigates the effect of using different common solvents on the self-assembly behavior of block copolymer nanoparticles, finding that the hydrogen bonding ability of the solvent strongly influences the size and shape of the particles, as well as their cytotoxicity.
Article
Polymer Science
Hanwen Lai, Guangcheng Huang, Xin Tian, Yadong Liu, Shengxiang Ji
Summary: The influence of line width roughness (LWR) and line edge roughness (LER) on the reliability and performance of transistors becomes more and more important in semiconductor fabrication. Directed self-assembly of block copolymers (DSA of BCPs) is a potential solution for next-generation lithography, but more research is needed on the influencing factors of LER and LWR in DSA.
Article
Polymer Science
Deborah Y. Liu, Daniel Krogstad
Summary: The study explores the use of ionic liquid as both a curing agent and a structure-directing agent in epoxy/BCP blends, achieving a wide range of self-assembled structures in the uncured blends, including hexagonally packed cylinders and lamellar structures. Many compositions undergo phase transitions during the curing process, with some transitions proving to be quite complex.
Article
Polymer Science
Su Eon Lee, Simon Kim, Jun Hyun Park, Ho Jun Jin, Hwa Soo Kim, Jang Hwan Kim, Hyeong Min Jin, Bong Hoon Kim
Summary: This study demonstrates a novel method to fabricate highly aligned lamellar nanostructures in a millimeter-scale large area by directing the self-assembly of block copolymer (BCP) thin films with a temporary thickness-gradient micropattern via simple two-step thermal annealing. The first step of thermal annealing guides the BCP nanostructure through geometric anchoring, while the second step causes thermal reflow of the height gradient micropattern to flatten it. The shear stress generated by thermal reflow enlarges the grain of the BCP nanostructure, resulting in a highly aligned lamellar pattern over the entire area. Finally, grazing-incidence small-angle x-ray scattering ensures the formation of periodic nanopatterns in large area.
JOURNAL OF POLYMER SCIENCE
(2023)
Article
Nanoscience & Nanotechnology
Gwenaelle Pound-Lana, Philippe Bezard, Camille Petit-Etienne, Sebastien Cavalaglio, Gilles Cunge, Benjamin Cabannes-Boue, Guillaume Fleury, Xavier Chevalier, Marc Zelsmann
Summary: This study developed full dry-etching strategies for BCP nanolithography and explored the application of different plasma in the process. The analysis of different interfacial layers and their effects under different plasma conditions was conducted. Finally, these features were successfully transferred to different substrates.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Nanoscience & Nanotechnology
Dong Hyup Kim, Ahram Suh, Geonhyeong Park, Dong Ki Yoon, So Youn Kim
Summary: Nanoscratch-directed self-assembly (DSA) is introduced as a simple and scalable strategy to achieve highly aligned block copolymer (BCP) nanopatterns over a large area, allowing versatile nanofabrication for various functional nanomaterials.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Nanoscience & Nanotechnology
Julia Cushen, Lei Wan, Gregory Blachut, Michael J. Maher, Thomas R. Albrecht, Christopher J. Ellison, C. Grant Willson, Ricardo Ruiz
ACS APPLIED MATERIALS & INTERFACES
(2015)
Article
Chemistry, Multidisciplinary
Shisheng Xiong, Lei Wan, Yoshihito Ishida, Yves-Andre Chapuis, Gordon S. W. Craig, Ricardo Ruiz, Paul F. Nealey
Article
Nanoscience & Nanotechnology
Shisheng Xiong, Yves-Andre Chapuis, Lei Wan, He Gao, Xiao Li, Ricardo Ruiz, Paul F. Nealey
Article
Nanoscience & Nanotechnology
Carl Haegglund, Gabriel Zeltzer, Ricardo Ruiz, Artit Wangperawong, Katherine E. Roelofs, Stacey F. Bent
Article
Multidisciplinary Sciences
Derek Nowak, William Morrison, H. Kumar Wickramasinghe, Junghoon Jahng, Eric Potma, Lei Wan, Ricardo Ruiz, Thomas R. Albrecht, Kristin Schmidt, Jane Frommer, Daniel P. Sanders, Sung Park
Article
Polymer Science
Ricardo Ruiz, Lei Wan, Rene Lopez, Thomas R. Albrecht
Article
Polymer Science
Jun Chen, Andrea Fasoli, Julia D. Cushen, Lei Wang, Ricardo Ruiz
Article
Materials Science, Multidisciplinary
K. Hono, Y. K. Takahashi, Ganping Ju, Jan-Ulrich Thiele, Antony Ajan, XiaoMin Yang, Ricardo Ruiz, Lei Wan
Article
Nanoscience & Nanotechnology
Lei Wan, Ricardo Ruiz
ACS APPLIED MATERIALS & INTERFACES
(2019)
Article
Materials Science, Multidisciplinary
Cherie R. Kagan, Taeghwan Hyeon, Dae-Hyeong Kim, Ricardo Ruiz, Maryann C. Tung, H-S Philip Wong
Article
Nanoscience & Nanotechnology
Boyce S. Chang, Whitney S. Loo, Beihang Yu, Scott Dhuey, Lei Wan, Paul F. Nealey, Ricardo Ruiz
Summary: We report a method for directed self-assembly of block copolymers using polymer inks that interpenetrate with existing polymer brushes. By selecting appropriate polymer inks, self-registered chemical contrast patterns can be generated at the same frequency as block copolymer domains. This method allows for a higher tolerance to dimensional and chemical imperfections in the guiding patterns.
ACS APPLIED MATERIALS & INTERFACES
(2020)
Article
Chemistry, Physical
Hongbo Feng, Moshe Dolejsi, Ning Zhu, Soonmin Yim, Whitney Loo, Peiyuan Ma, Chun Zhou, Gordon S. W. Craig, Wen Chen, Lei Wan, Ricardo Ruiz, Juan J. de Pablo, Stuart J. Rowan, Paul F. Nealey
Summary: This paper presents a high-throughput synthesis and characterization platform for the discovery and optimization of block copolymers (BCPs) for lithographic patterning. By synthesizing a library of BCPs covering a large parameter space, researchers are able to identify BCP chemistries that satisfy the design rules.
Article
Polymer Science
Whitney S. Loo, Hongbo Feng, Thomas J. Ferron, Ricardo Ruiz, Daniel F. Sunday, Paul F. Nealey
Summary: This study experimentally measured the extent of mixing and segregation strength of a series of lamellar A-b-(B-r-C) block copolymers. The researchers proposed using the extent of mixing to evaluate the thermodynamic parameters of block copolymers.
Article
Chemistry, Physical
He Li, Boyce S. Chang, Hyunseok Kim, Zongliang Xie, Antione Laine, Le Ma, Tianlei Xu, Chongqing Yang, Junpyo Kwon, Steve W. Shelton, Liana M. Klivansky, Virginia Altoe, Bing Gao, Adam M. Schwartzberg, Zongren Peng, Robert O. Ritchie, Ting Xu, Miquel Salmeron, Ricardo Ruiz, K. Barry Sharpless, Peng Wu, Yi Liu
Summary: Designing high-capacity polymer dielectrics that can operate efficiently under harsh electrical conditions is challenging. However, polysulfates synthesized through SuFEx catalysis were found to be high-performing dielectric polymers that can overcome these challenges. Free-standing polysulfate thin films exhibit superior insulating properties and dielectric stability at high temperatures, which can be further improved with ultrathin oxide coatings. These advancements lead to electrostatic film capacitors with high breakdown strength and discharged energy density, outperforming current state-of-the-art dielectric materials.
Article
Chemistry, Multidisciplinary
Lei Wan, Ricardo Ruiz, He Gao, Thomas R. Albrecht
