Realization of wafer-scale single-crystalline GaN film on CMOS-compatible Si(100) substrate by ion-cutting technique
出版年份 2020 全文链接
标题
Realization of wafer-scale single-crystalline GaN film on CMOS-compatible Si(100) substrate by ion-cutting technique
作者
关键词
-
出版物
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 35, Issue 12, Pages 125004
出版商
IOP Publishing
发表日期
2020-08-19
DOI
10.1088/1361-6641/abb073
参考文献
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