Uniformity and passivation research of Al2O3 film on silicon substrate prepared by plasma-enhanced atom layer deposition

Preparation of p+-layers using water vapour as oxidant in BBr3diffusion for silicon solar cells

(2013) Chunlan Zhou et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

(2012) G. Dingemans et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Electronic and chemical properties of the c-Si/Al2O3 interface

(2011) Florian Werner et al.   JOURNAL OF APPLIED PHYSICS

Very low surface recombination velocity on p-type c-Si by high-rate plasma-deposited aluminum oxide

(2009) Pierre Saint-Cast et al.   APPLIED PHYSICS LETTERS

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS