Reduction mechanisms of the CuO(111) surface through surface oxygen vacancy formation and hydrogen adsorption

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

(2011) Thomas J. Knisley et al.   CHEMISTRY OF MATERIALS

Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures

(2011) Jani Hämäläinen et al.   JOURNAL OF MATERIALS CHEMISTRY

Investigation of AlMe3, BEt3, and ZnEt2as Co-Reagents for Low-Temperature Copper Metal ALD/Pulsed-CVD

(2010) Balamurugan Vidjayacoumar et al.   CHEMISTRY OF MATERIALS

CVD of Pure Copper Films from Amidinate Precursor

(2010) Vladislav Krisyuk et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Effects on Electronic Properties of Molecule Adsorption on CuO Surfaces and Nanowires

(2010) Jun Hu et al.   Journal of Physical Chemistry C

Stability and electronic properties of the O-terminated Cu2O(111) surfaces: First-principles investigation

(2010) Chong Li et al.   PHYSICS LETTERS A

Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc

(2009) Byoung H. Lee et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Composition, structure, and stability of the rutileTiO2(110)surface: Oxygen depletion, hydroxylation, hydrogen migration, and water adsorption

(2009) Piotr M. Kowalski et al.   PHYSICAL REVIEW B

Density-Functional Calculations of the Structure of Near-Surface Oxygen Vacancies and Electron Localization onCeO2(111)

(2009) M. Verónica Ganduglia-Pirovano et al.   PHYSICAL REVIEW LETTERS