Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc

标题
Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc
作者
关键词
-
出版物
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
Volume 48, Issue 25, Pages 4536-4539
出版商
Wiley
发表日期
2009-05-14
DOI
10.1002/anie.200900414

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