Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

标题
Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 103, Issue 11, Pages 113509
出版商
AIP Publishing
发表日期
2008-06-11
DOI
10.1063/1.2938052

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