Recent Development in Molecular Resists for Extreme Ultraviolet Lithography

Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups

(2011) Nobumitsu Niina et al.   POLYMER JOURNAL

Novel extreme ultraviolet (EUV)-resist material based on noria (water wheel-like cyclic oligomer)

(2010) Hiroto Kudo et al.   JOURNAL OF MATERIALS CHEMISTRY

JSR EUV Resist Development toward 22nmhp Design and Beyond

(2010) Tooru Kimura et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Extreme Ultraviolet (EUV)-Resist Materials of Noria (Water Wheel-Like Cyclic Oligomer) Derivatives containing Acetal Moieties

(2010) Hiroto Kudo et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Synthesis of Noria-like Macrocycles Containing Alkoxy Groups based on a Dynamic Covalent Chemistry (DCC) System by the A2+ B4Condensation

(2009) Nobumitsu Niina et al.   CHEMISTRY LETTERS

Synthesis of Photoacid Generator-Containing Patternable Diblock Copolymers by Reversible Addition−Fragmentation Transfer Polymerization

(2009) Yun Jun Kim et al.   CHEMISTRY OF MATERIALS

Environmentally friendly patterning of molecular waterwheel (Noria) in supercritical carbon dioxide

(2009) Manabu Tanaka et al.   JOURNAL OF MATERIALS CHEMISTRY

High Resolution Positive-Working Molecular Resist Derived from Truxene

(2009) Shigeki Hattori et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Fullerene Resist Materials for the 32 nm Node and Beyond

(2008) Francis P. Gibbons et al.   ADVANCED FUNCTIONAL MATERIALS

Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography

(2008) Anuja De Silva et al.   CHEMISTRY OF MATERIALS