Complementary and bipolar regimes of resistive switching in TiN/HfO2/TiN stacks grown by atomic-layer deposition

标题
Complementary and bipolar regimes of resistive switching in TiN/HfO2/TiN stacks grown by atomic-layer deposition
作者
关键词
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出版物
出版商
Wiley
发表日期
2015-01-20
DOI
10.1002/pssa.201431674

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