A low thermal impact annealing process for SiO2-embedded Si nanocrystals with optimized interface quality
出版年份 2014 全文链接
标题
A low thermal impact annealing process for SiO2-embedded Si nanocrystals with optimized interface quality
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 115, Issue 13, Pages 134311
出版商
AIP Publishing
发表日期
2014-04-04
DOI
10.1063/1.4870819
参考文献
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