Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor

Published 2015 View Full Article

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Title
Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 33, Issue 5, Pages 05E121
Publisher
American Vacuum Society
Online
2015-07-30
DOI
10.1116/1.4927493

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