Thermal chemistry of the Cu-KI5 atomic layer deposition precursor on a copper surface

Title
Thermal chemistry of the Cu-KI5 atomic layer deposition precursor on a copper surface
Authors
Keywords
-
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 33, Issue 1, Pages 01A108
Publisher
American Vacuum Society
Online
2014-10-02
DOI
10.1116/1.4896940

Ask authors/readers for more resources

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started