The Etching Properties of Al2O3Thin Films in BCl3/Cl2/Ar Plasma

Published 2009 View Full Article

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Title
The Etching Properties of Al2O3Thin Films in BCl3/Cl2/Ar Plasma
Authors
Keywords
-
Journal
FERROELECTRICS
Volume 384, Issue 1, Pages 39-46
Publisher
Informa UK Limited
Online
2009-06-15
DOI
10.1080/00150190902892741
References
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