Machine learning-based novelty detection for faulty wafer detection in semiconductor manufacturing

Published 2011 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Machine learning-based novelty detection for faulty wafer detection in semiconductor manufacturing
Authors
Keywords
-
Journal
EXPERT SYSTEMS WITH APPLICATIONS
Volume 39, Issue 4, Pages 4075-4083
Publisher
Elsevier BV
Online
2011-09-30
DOI
10.1016/j.eswa.2011.09.088

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.