4.6 Article

Suppression of Charge Recombination in Dye-Sensitized Solar Cells Using the Plasma Treatment of Fluorine-Doped Tin Oxide Substrates

Journal

JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 162, Issue 12, Pages H903-H909

Publisher

ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.0851512jes

Keywords

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Funding

  1. National Research Foundation (NRF) - Korea government (MSIP) [NRF-2014R1A2A2A01006994]
  2. Korea CCS R&D Center (KCRC) - Korea government (MSIP) [2014M1A8A1049345]
  3. NRF-RFBR Joint Research Program through the National Research Foundation [NRF-2013K2A1A7076282]
  4. Future Core Technology Project of the Korea Institute of Science and Technology (KIST) [2E23964-13-045]
  5. National Research Foundation Postdoctoral Fellowship Program [NRF-2014K2A4A1034681]
  6. Korea Brain Pool Program [131S-6-3-0538]
  7. National Research Foundation of Korea [2014M1A8A1049293, 152S-5-3-1456] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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This study presents a novel strategy for increasing the efficiency of dye-sensitized solar cells (DSCs) through modifying the surface of the fluorine-doped tin oxide (FTC) substrates using an atmospheric pressure plasma treatment. This strategy allows the suppression of charge recombination at the interface between the FTO substrate and electrolyte due to the formation of a thin, compact TiO2 blocking layer (BL) on the FTO surface without cracks and holes. Furthermore, the transmittance of the plasma-treated FTO/BL interface is higher than that of the pristine structure due to the compact morphology of the BL on the plasma-treated FTO. Thus, this strategy enables simultaneous improvement in light harvesting and photo-generated carrier collection. DSCs that use plasma-treated FTO substrates achieve higher efficiencies of 8.86% compared with the 8.04% of the reference device. (C) 2015 The Electrochemical Society. All rights reserved.

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