Modeling the stress enhancement of plasma enhanced chemical vapor deposited silicon nitride films by UV post treatment – impact of the film density

Published 2008 View Full Article

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Title
Modeling the stress enhancement of plasma enhanced chemical vapor deposited silicon nitride films by UV post treatment – impact of the film density
Authors
Keywords
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Journal
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
Volume 43, Issue 3, Pages 315-320
Publisher
EDP Sciences
Online
2008-05-05
DOI
10.1051/epjap:2008081

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