Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Published 2010 View Full Article

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Title
Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods
Authors
Keywords
-
Journal
ELECTROCHIMICA ACTA
Volume 56, Issue 3, Pages 1172-1181
Publisher
Elsevier BV
Online
2010-11-12
DOI
10.1016/j.electacta.2010.11.006

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