Metal-assisted etching of p-type silicon under anodic polarization in HF solution with and without H2O2

Published 2009 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Metal-assisted etching of p-type silicon under anodic polarization in HF solution with and without H2O2
Authors
Keywords
-
Journal
ELECTROCHIMICA ACTA
Volume 55, Issue 3, Pages 903-912
Publisher
Elsevier BV
Online
2009-09-23
DOI
10.1016/j.electacta.2009.09.048

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.