Enhancement of filling performance of a copper plating formula at low chloride concentration

Title
Enhancement of filling performance of a copper plating formula at low chloride concentration
Authors
Keywords
-
Journal
ELECTROCHIMICA ACTA
Volume 53, Issue 10, Pages 3610-3619
Publisher
Elsevier BV
Online
2007-12-26
DOI
10.1016/j.electacta.2007.12.048

Ask authors/readers for more resources

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now