Journal
ELECTROCHEMISTRY
Volume 76, Issue 2, Pages 121-124Publisher
ELECTROCHEMICAL SOC JAPAN
DOI: 10.5796/electrochemistry.76.121
Keywords
electrodeposition; silicon; less-noble metal; photo-assisted deposition
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We investigate the influence of illumination on morphology of less-noble metal electrodeposits on p-type Si. Compared to the case of Pt or Cu systems, the particle size and density did not change so much with light intensity in Ni and Co systems, while the cathodic current drastically changed with light intensity. The hexagonal shape of Co particles, which were formed under illumination of low intensity, indicated that the growth of particles was relatively preferred under the low carrier flux condition. The current transient follows progressive nucleation according to the Scharifker-Hills model, as can be seen in Pt or Cu.
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