Enhanced Detection of Copper Impurity in Silicon Wafer by Dynamic Secondary Ion Mass Spectrometry

Published 2010 View Full Article

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Title
Enhanced Detection of Copper Impurity in Silicon Wafer by Dynamic Secondary Ion Mass Spectrometry
Authors
Keywords
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Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 14, Issue 3, Pages H110
Publisher
The Electrochemical Society
Online
2010-12-21
DOI
10.1149/1.3526095
References
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