Work Function Tuning of Ti[sub x]Si[sub y]N[sub z] Electrodes Using Partial Saturation of Chemisorbing Surface during Pulsing Chemical Vapor Deposition
Work Function Tuning of Ti[sub x]Si[sub y]N[sub z] Electrodes Using Partial Saturation of Chemisorbing Surface during Pulsing Chemical Vapor Deposition
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