Thermal Annealing Effects on the Atomic Layer Deposited LaAlO[sub 3] Thin Films on Si Substrate

Published 2008 View Full Article

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Title
Thermal Annealing Effects on the Atomic Layer Deposited LaAlO[sub 3] Thin Films on Si Substrate
Authors
Keywords
-
Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 11, Issue 7, Pages G33
Publisher
The Electrochemical Society
Online
2008-05-16
DOI
10.1149/1.2916437

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