High aspect ratio optical gratings in diamond

In this paper we describe a process for fabricating high aspect ratio gratings in single- or polycrystalline diamond with the high precision required by micro-optics. Nanoimprint lithography with a soft stamp and several layers of hard masks allowed for rapid and accurate replication of patterns written by e-beam or laser into thick Al masks on diamond substrates as large as 2 cm in diameter. Vertical sidewalls in the mask were crucial for avoiding microvilli formation during diamond plasma etching and were achieved by etching and oxidizing the Al mask in cycles. Circularly symmetric half-wave plates for wavelength bands around 4 and 11 mu m were fabricated with deep circular gratings on one side and antireflective gratings on the other. (C) 2013 Elsevier B.V. All rights reserved.