Thermal stability of RuO2 thin films prepared by modified atomic layer deposition

Published 2012 View Full Article

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Title
Thermal stability of RuO2 thin films prepared by modified atomic layer deposition
Authors
Keywords
-
Journal
CURRENT APPLIED PHYSICS
Volume 12, Issue -, Pages S160-S163
Publisher
Elsevier BV
Online
2012-02-24
DOI
10.1016/j.cap.2012.02.050

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