Deposition rate of SiN film grown by using a pulsed-PECVD at room-temperature

Published 2010 View Full Article

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Title
Deposition rate of SiN film grown by using a pulsed-PECVD at room-temperature
Authors
Keywords
-
Journal
CURRENT APPLIED PHYSICS
Volume 10, Issue 3, Pages S372-S374
Publisher
Elsevier BV
Online
2010-02-20
DOI
10.1016/j.cap.2010.02.033

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