Bisphosphonate Remains Highly Localized After Elution From Porous Implants

Title
Bisphosphonate Remains Highly Localized After Elution From Porous Implants
Authors
Keywords
-
Journal
CLINICAL ORTHOPAEDICS AND RELATED RESEARCH
Volume 469, Issue 2, Pages 514-522
Publisher
Ovid Technologies (Wolters Kluwer Health)
Online
2010-08-30
DOI
10.1007/s11999-010-1527-x

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